- AUTOCUTS
- CCD camera
- CryoMatrix® holey Grid
- Magnetic Field Cancelling System
- Vibration Isolation System
- HATA-Holder System
- PIE plasma cleaners
- Nexperion SentineL
- WET-SEM
- Temassist-Towards Automatic TEM solutions
- FEG and LaB6 filament
- Compressors
- Chiller
- Vacuum System
- High-vacuum Optical Platform for cryo-CLEM
- Quick Freeze Substitution Equipment
- Agar Auto Sputter Coater
- Coating instrument
- Cryo-FIB sample preparation
- Nanometer Pattern Generation System
Product Details
It is a pressure-driven multifunctional nanoimprint machine, with hot embossing and UV embossing function, maximum support 6 inches imprint template. The addition of PDMS、SFP? & Hybrid Mold? soft template imprint technology can eliminate defects of imprinting results caused by dust at maximum extent, and support surfaces imprint . Currently LH-150 has been widely used in graphical sapphire substrate, solar cells, optical waveguide devices, biochips and other areas.
Technical specifications
Substrate size |
Up to 8” circle, irregular shapes and sizes compatible |
Imprint area |
Same as substrate |
Mold plate size |
Up to 8” circle |
Vacuum |
-95kpa |
Weight |
300 Kg |
Thermal imprint/embossing |
|
Imprint pressure |
Up to8bar |
Heating temperature |
Up to 250℃ |
Heating mode |
Electromagnetic induction |
UV imprint (optional) |
|
UV source |
High pressure mercury lamp |
UV lamp power |
1000 Watt |
Imprint pressure |
Up to 6 bar |
Installation requirements |
|
Filtered pressure source |
8bar |
Power |
110/220V, 50/60Hz , 4.0 KW or higher |
Cleanroom class |
1000 or better |
Product appearance